Surface Energy Characterization for Die-Level Cu Hybrid Bonding
Author:
Affiliation:
1. IBM T. J. Watson Research Center,Albany,NY,U.S.A.
2. ASM Pacific Technology,Tsing Yi,Hong Kong
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9816066/9816372/09816543.pdf?arnumber=9816543
Reference10 articles.
1. Wafer-scale microdevice transfer/interconnect: from a new integration method to its application in an afm-based data-storage system
2. Toward Three-Dimensional High Density
3. Interface engineering for high interfacial strength between SiCOH and porous SiCOH interconnect dielectrics and diffusion caps
4. Reliability of a 300-mm-compatible 3DI technology based on hybrid Cu-adhesive wafer bonding;yu;2009 Symposium on VLSI Technology,2009
5. A 300-mm wafer-level three-dimensional integration scheme using tungsten through-silicon via and hybrid Cu-adhesive bonding
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