High Quality Co-Sputtering AlScN Thin Films for Piezoelectric Lamb-Wave Resonators
Author:
Affiliation:
1. School of Information Science and Technology, ShanghaiTech University, Shanghai, China
2. Evatec AG, Trüebbach, Switzerland
Funder
National Natural Science Foundation of China
Natural Science Foundation of Shanghai
Lingang Laboratory
Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Link
http://xplorestaging.ieee.org/ielx7/84/9785947/09751235.pdf?arnumber=9751235
Reference52 articles.
1. Over 10% of ${k}_{\text{eff}}^{{2}}$ Demonstrated by 2-GHz Spurious Mode-Free Sc0.12Al0.88N Laterally Coupled Alternating Thickness Mode Resonators
2. High-Overtone Thin Film Ferroelectric AlScN-on-Silicon Composite Resonators
3. Reactive ion beam etching of piezoelectric ScAlN for bulk acoustic wave device applications
4. ScAlN etch mask for highly selective silicon etching
5. A Segmented‐Target Sputtering Process for Growth of Sub‐50 nm Ferroelectric Scandium–Aluminum–Nitride Films with Composition and Stress Tuning
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