A Segmented‐Target Sputtering Process for Growth of Sub‐50 nm Ferroelectric Scandium–Aluminum–Nitride Films with Composition and Stress Tuning
Author:
Affiliation:
1. Electrical and Computer Engineering Department University of Florida P.O. Box 116200 Gainesville FL USA
2. Plasma-Therm LLC. 10050 16th St. N Saint Petersburg FL USA
Funder
Defense Advanced Research Projects Agency
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssr.202100087
Reference22 articles.
1. AlScN: A III-V semiconductor based ferroelectric
2. Effects of deposition conditions on the ferroelectric properties of (Al1−xScx)N thin films
3. Experimental determination of the electro-acoustic properties of thin film AlScN using surface acoustic wave resonators
4. Influence of scandium concentration on power generation figure of merit of scandium aluminum nitride thin films
5. Preparation of scandium aluminum nitride thin films by using scandium aluminum alloy sputtering target and design of experiments
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