Enhanced Reliability of 7-nm Process Technology Featuring EUV-Reference-Cited by-同舟云学术

Enhanced Reliability of 7-nm Process Technology Featuring EUV

Published:2019-12 Issue:12 Volume:66 Page:5399-5403
ISSN:0018-9383
Container-title:IEEE Transactions on Electron Devices
language:
Short-container-title:IEEE Trans. Electron Devices

Author:

Choi Kihyun^ORCID,Shim Hyewon,Park Junekyun,Cho Youngwoo^ORCID,Rhee Hwasung,Pae Sangwoo,Sagong Hyun Chul,Kang Wonchang,Kim Hyunjin,Hai Jiang,Lee Miji,Kim Bomi,Lee Mi-Ji,Lee Soonyoung

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx7/16/8915786/08897599.pdf?arnumber=8897599

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