Initial Reaction of Hexachlorodisilane on Amorphous Silica Surface for Atomic Layer Deposition Using Density Functional Theory
Author:
Funder
KOREA-US Technology Cooperation Program
Publisher
Korean Ceramic Society
Subject
Ceramics and Composites
Link
http://www.jkcs.or.kr/upload/pdf/jkcs-54-5-443.pdf
Reference30 articles.
1. A brief review of atomic layer deposition: from fundamentals to applications
2. Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges
3. Conformality of Plasma-Assisted ALD: Physical Processes and Modeling
4. Atomic Layer Deposition: An Overview
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