Thermal decomposition pathways of chlorinated trisilanes-Reference-Cited by-同舟云学术

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Thermal decomposition pathways of chlorinated trisilanes

Published:2022-12-05 Issue: Volume: Page:
ISSN:1876-990X
Container-title:Silicon
language:en
Short-container-title:Silicon

Author:

Yu Neung-Kyung,Kim Kyungjun,Heo Changhoon,Lee Jinhee,Kim Wonyeob,Chung Sung-Woong,Shong Bonggeun

Funder

Korea Institute for Advancement of Technology

Hongik University

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Link

https://link.springer.com/content/pdf/10.1007/s12633-022-02248-8.pdf

Reference53 articles.

1. Krstic Z, Krstic VD (2012) Silicon nitride: the engineering material of the future. J Mater Sci 47:535–552. https://doi.org/10.1007/s10853-011-5942-5

2. Meng X, Byun Y-C, Kim HS et al (2016) Atomic layer deposition of silicon nitride thin films: a review of recent progress, challenges, and outlooks. Materials 9:1007. https://doi.org/10.3390/ma9121007

3. Ovanesyan RA, Filatova EA, Elliott SD et al (2019) Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: current status and future outlook. J Vac Sci Technol A 37:060904. https://doi.org/10.1116/1.5113631

4. Kaloyeros AE, Pan Y, Goff J, Arkles B (2020) Review—silicon nitride and silicon nitride-rich thin film technologies: state-of-the-art processing technologies, properties, and applications. ECS J Solid State Sci Technol 9:063006. https://doi.org/10.1149/2162-8777/aba447

5. Yu N-K, Moon CH, Park J et al (2021) Evaluation of silicon tetrahalide precursors for low-temperature thermal atomic layer deposition of silicon nitride. Appl Surf Sci 565:150603. https://doi.org/10.1016/j.apsusc.2021.150603

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