Surface defects generated by extrinsic origins on 4H-SiC epitaxial-wafers observed by scanning electron microscopy

Author:

Matsuhata Hirofumi,Sugiyama Naoyuki,Chen Bin,Yamashita Tamotsu,Hatakeyama Tetsuo,Sekiguchi Takashi

Funder

Novel Semiconductor Power Electronics Project Realizing Low Carbon Emission Society

Ministry of Economy, Trade and Industry (METI)

New Energy and Industrial Technology Organization (NEDO) in Japan

Publisher

Oxford University Press (OUP)

Subject

Radiology, Nuclear Medicine and imaging,Instrumentation,Structural Biology

Reference21 articles.

1. Comparison of 6H-SiC, 3C-SiC, and Si for power devices

2. Effect of surface morphological defects and crystallographic defects on reliability of thermal oxides on C-face;Suzuki;Mater. Sci. Forum,2012

3. Correlation between surface morphological defects and crystallographic defects in SiC;Hatakeyama;Mater. Sci. Forum,2012

4. Relation between defects on 4H-SiC epitaxial surface and gate oxide reliability;Sameshima;Mater. Sci. Forum,2013

5. Gate oxide reliability on trapezoid-shaped defects and obtuse triangular defects in 4H-SiC epitaxial wafers;Ishiyama;Jpn. J. Appl. Phys.,2014

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3