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Effect of Plasma Gases on Insulating Properties of Low-Temperature-Deposited SiOCH Films Prepared by Remote Plasma-Enhanced Chemical Vapor Deposition

  • Published:2007-04-24 Issue:4B Volume:46 Page:1997-2000
  • ISSN:0021-4922
  • Container-title:Japanese Journal of Applied Physics
  • language:en
  • Short-container-title:Jpn. J. Appl. Phys.

Author:

Yamaoka Keisuke,Okada Naomichi,Yoshizako Yuji,Terai Yoshikazu,Fujiwara Yasufumi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron Transport Properties in HSi(OC2H5)3Vapor;Japanese Journal of Applied Physics;2011-12-01

2. Electron Transport Properties in HSi(OC$_{2}$H$_{5}$)$_{3}$ Vapor;Japanese Journal of Applied Physics;2011-11-28

3. Low-Temperature Deposition of Amorphous Carbon Films for Surface Passivation of Carbon-Doped Silicon Oxide;Advanced Materials Research;2007-10

4. 機能性微粒子を含有した薄膜の作製と光デバイス応用;Hosokawa Powder Technology Foundation ANNUAL REPORT;2007
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