機能性微粒子を含有した薄膜の作製と光デバイス応用-Reference-Cited by-同舟云学术

機能性微粒子を含有した薄膜の作製と光デバイス応用

Published:2007 Issue:0 Volume:15 Page:131-133
ISSN:2189-4663
Container-title:Hosokawa Powder Technology Foundation ANNUAL REPORT
language:en
Short-container-title:Hosokawa Foundation ANNUAL REPORT

Author:

Yamaoka Keisuke¹,Fujiwara Yasufumi¹

Affiliation:

1. Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University, Japan

Publisher

Hosokawa Powder Technology Foundation

Subject

General Medicine

Link

https://www.jstage.jst.go.jp/article/hptf/15/0/15_06504/_pdf

Reference5 articles.

1. K. Yamaoka, N. Okada, Y. Yoshizako, Y. Terai, and Y. Fujiwara, “Effect of plasma gases on insulating properties of low-temperature-deposited SiOCH films prepared by remote plasma-enhanced chemical vapor deposition”, Japanese Journal of Applied Physics 46(4B), pp. 1997-2000 (2007).

2. K. Yamaoka, Y. Terai, N. Okada, T. Yamaguchi, Y. Yoshizako, and Y. Fujiwara, “Low-temperature deposition of amorphous carbon films for surface passivation of carbon-doped silicon oxide”, Advanced Materials Research 26-28, pp. 645-648 (2007).

3. K. Yamaoka, Y. Terai, T. Yamaguchi, and Y. Fujiwara, “Growth of transition-metal-doped ZnO films by plasma-enhanced CVD combined with RF sputtering”, Physica Status Solidi (c) (2008) 5.9: 3125-3127.

4. K. Yamoaka, Y. Terai, T. Yamaguchi, and Y. Fujiwara, “Effects of RF power on impurity-doped zinc oxide films by plasma-enhanced chemical vapor deposition”, The 34^th International Symposium on Compound Semiconductors (iscs2007), ThE P8, Kyoto, Japan, October 18, 2007.

5. K. Yamaoka, Y. Terai, N. Okada, T. Yamaguchi, Y. Yoshizako, and Y. Fujiwara, “Low temperature deposition of amorphous carbon films for surface passivation of carbon-doped silicon oxide” The Sixth Pacific Rim International Conference on Advanced Materials and Processing (PRICM6), P2-011, Jeju Island, Korea, November 8, 2007.