Study of EB Resist Simulation for EUV Resist Evaluation-Reference-Cited by-同舟云学术

Study of EB Resist Simulation for EUV Resist Evaluation

Published:2020-07-01 Issue:2 Volume:33 Page:221-228
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Ohta Yosuke¹,Sekiguchi Atsushi¹,Voigt Anja²,Taksatorn Nit³

Affiliation:

1. Litho Tech Japan Corporation

2. micro resist technology GmbH

3. GenISys K.K

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/33/2/33_221/_pdf

Reference12 articles.

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2. 2. T. Watanabe, H. Hada, H. Kinoshita, Y. Tanaka, H. Shiotani, Y. Fukushima, and H. Komano, Proc. SPIE, 6153 (2006) 615343.

3. 3. T. Watanabe, H. Hada, Y. Fukushima, H. Shiotani, H. Kinoshita, and H. Komano, “Synchrotron Radiation Instrumentation: Ninth International Conference”, AIP, 879 (2007) 1470.

4. 4. T. Watanabe, K. Emura, D. Shiono, Y. Haruyama, Y. Muramatsu, K. Ohmori, K. Sato, T. Harada, and H. Kinoshita, J. Photopolym. Sci. Technol., 26 (2013) 635.

5. 5. K. Emura, T. Watanabe, M. Yamaguchi, H. Tanino, T. Fukui, D. Shiono, Y. Haruyama, Y. Muramatsu, K. Ohmori, K. Sato, T. Harada, and H. Kinoshita, J. Photopolym. Sci. Technol., 27 (2014) 631.

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