EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement-Reference-Cited by-同舟云学术

EUV Resist Chemical Analysis by Soft X-ray Absorption Spectroscopy for High Sensitivity Achievement

Published:2014 Issue:5 Volume:27 Page:631-638
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Emura Kazuya,Watanabe Takeo,Yamaguchi Masato,Tanino Hirohito,Fukui Tsubasa,Shiono Daiju,Haruyama Yuichi,Muramatsu Yasuji,Ohmori Katsumi,Sato Kazufumi,Harada Tetsuo,Kinoshita Hiroo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/5/27_631/_pdf

Reference33 articles.

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3. 3. Takuro Urayama, Takeo Watanabe, Yuya Yamaguchi, Naohiro Matsuda, Yasuyuki Fukushima, Takafumi Iguchi, Tetsuo Harada, and Hiroo Kinoshita, J. Photopolymer Sci. Technol, 23 (2011) 681.

4. 4. International Technology Roadmap for Semiconductors 2011 Edition.

5. 5. Hakaru Mizoguchi, Tamotsu Abe, Yukio Watanabe, Takanobu Ishihara, Takeshi Ohta, Tsukasa Hori, Akihiko Kurosu, Hiroshi Komori, Kouji Kakizaki, Akira Sumitani, Osamu Wakabayashi, Hiroaki Nakarai, Junichi Fujimoto, and Akira Endo, Proc. SPIE 7636, (2010) 7636-08.

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