Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure-Reference-Cited by-同舟云学术

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Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure

Published:2024-06-25 Issue:3 Volume:37 Page:299-304
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Ohta Yosuke¹,Sekiguchi Atsushi¹,Fujiwara Tadayuki¹,Yamakawa Shinji²,Harada Tetsuo²,Watanabe Takeo²,Yamamoto Hiroki³

Affiliation:

1. Litho Tech Japan Corporation

2. Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo

3. Takasaki Advanced Radiation Research, National Institutes for Quantum Science and Technology

Publisher

Technical Association of Photopolymers, Japan

Link

https://www.jstage.jst.go.jp/article/photopolymer/37/3/37_299/_pdf

Reference18 articles.

1. 1. H. Kinoshita, T. Kaneko, H. Takei, N. Takeuchi, and S. Ishihara, 47th Autumn Meeting of the Japan Society of Applied Physics, 28-ZF-15 (1986) 332 (in Japanese).

2. 2. H. Kinoshita, K. Kurihara, T. Mizota, T. Haga, H. Takenaka, and Y. Torii, Appl. Opt., 32 (1993) 7079.

3. 3. T. Haga, M. Tinone, H. Takenaka, and H. Kinoshita, Microelectron Eng., 30 (1996) 179.

4. 4. Y. Ekinci, M. Vockenhuber, M. Hojeij, L. Wang, and N. Mojarad, Proc. SPIE, 8679 (2013) 867910.

5. 5. W. J. Bae, M. Trikeriotis, R. Rodriguez, M. F. Zettel, E. Piscani, C. K. Ober, E. P. Giannelis, and P. Zimmerman, Proc. SPIE, 7273 (2009) 727326.

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