Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system-Reference-Cited by-同舟云学术

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Large-area, high-resolution pattern replication by the use of a two-aspherical-mirror system

Published:1993-12-01 Issue:34 Volume:32 Page:7079
ISSN:0003-6935
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Kinoshita H.,Kurihara K.,Mizota T.,Haga T.,Takenaka H.,Torii Y.

Publisher

The Optical Society

Reference6 articles.

1. Current research activities in the field of multilayers for soft X-rays in Japan

2. Soft x-ray reduction lithography using multilayer mirrors

3. Reflective systems design study for soft x-ray projection lithography

4. Soft x-ray projection lithography

5. Short-wavelength annular-field optical system for imaging tenth-micron features

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