Novel EUV Resist Materials for 7 nm Node and Beyond-Reference-Cited by-同舟云学术

Novel EUV Resist Materials for 7 nm Node and Beyond

Published:2018-06-25 Issue:2 Volume:31 Page:201-207
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Furutani Hajime¹,Shirakawa Michihiro¹,Nihashi Wataru¹,Sakita Kyohei¹,Oka Hironori¹,Fujita Mitsuhiro¹,Omatsu Tadashi¹,Tsuchihashi Toru¹,Fujmaki Nishiki¹,Fujimori Toru¹

Affiliation:

1. Electronic Materials Research Laboratories, Research & Development Management Headquarters, FUJIFILM Corporation

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/31/2/31_201/_pdf

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5. 5. H. Tsubaki, W. Nihashi, T. Tsuchihashi, K. Yamamoto, and T. Goto, Proc. SPIE, 9776 (2016) 977608.

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