Dynamic absorption coefficients of CAR and non-CAR resists at EUV
Author:
Affiliation:
1. Paul Scherrer Institute (Switzerland)
2. Inpria Corp. (United States)
3. The Univ. of Birmingham (United Kingdom)
Publisher
SPIE
Reference22 articles.
1. Optical Properties of Photoresists;MicroChemicals,2013
2. Parameter extraction for 193 nm chemically amplified resist from refractive index change
3. X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92
4. High Absorbing Resists Based on Trifluoromethacrylate-Vinyl Ether Copolymers for EUV Lithography,;Christianson,2013
5. Absorbance measurement of polymers at extreme ultraviolet wavelength: Correlation between experimental and theoretical calculations
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