Author:
Higgins Craig,Antohe Alin,Denbeaux Greg,Kruger Seth,Georger Jacque,Brainard Robert
Cited by
24 articles.
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1. Understanding the onset of EUV resist chemical stochastics;Japanese Journal of Applied Physics;2023-06-01
2. Inorganic hardmask development for extreme ultraviolet patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-07-31
3. Novel EUV Resist Materials for 7 nm Node and Beyond;Journal of Photopolymer Science and Technology;2018-06-25
4. Inorganic Hardmask Development for EUV Patterning;Extreme Ultraviolet (EUV) Lithography IX;2018-03-19
5. Novel EUV resist materials for 7 nm node and beyond;Advances in Patterning Materials and Processes XXXV;2018-03-13