Inorganic Hardmask Development for EUV Patterning-Reference-Cited by-同舟云学术

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Inorganic Hardmask Development for EUV Patterning

Published:2018-03-19 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography IX
language:
Short-container-title:

Author:

Yao Yiping,De Silva Anuja,Dutta Ashim,Mignot Yann,Meli Luciana,Guo Jing,Felix Nelson M.

Publisher

SPIE

Reference30 articles.

1. EUV Patterning Successes and Frontiers;Felix,2016

2. Progress in EUV lithography toward manufacturing;Kim,2017

3. EUV processing and characterization for BEOL;Saulnier,2015

4. Single-expose patterning development for EUV lithography;De Silva,2017

5. Exploring the readiness of EUV photo materials for patterning advanced technology nodes;De Simone,2017

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spin-on metal-oxide underlayer for EUV patterning;Advances in Patterning Materials and Processes XLI;2024-04-09

2. Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography;Polymers;2020-12-12

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