1. ITRS, The International Technology Roadmap for Semiconductors (2013).
2. Critical challenges for EUV resist materials;Naulleau,2011
3. EUV resist performance: current assessment for sub-22 nm half-pitch patterning on NXE:3300;Wallow,2012
4. Evaluation of EUV resist materials for use at the 32 nm half-pitch node;Wallow,2008
5. EUV resist materials design for 15 nm hp and below;Tsubaki,2012