4H-SiC Homoepitaxial Growth on Substrate with Vicinal Off-Angle Lower than 1°
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference33 articles.
1. The Epitaxial Growth of Silicon Carbide
2. Epitaxial deposition of silicon carbide from silicon tetrachloride and hexane
3. Fabrication of P-N Junction Diodes Using Homoepitaxially Grown 6H-SiC at Low Temperature by Chemical Vapor Deposition
4. Chemical vapor deposition and characterization of 6H‐SiC thin films on off‐axis 6H‐SiC substrates
5. http://www.cree.com.
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization and formation mechanism of short step-bunching defects on 4H-SiC thick homoepitaxial films;Journal of Crystal Growth;2024-05
2. Lowest Concentration of Chlorine Trifluoride Gas for Cleaning Silicon Carbide Chemical Vapor Deposition Reactor;ECS Journal of Solid State Science and Technology;2022-08-01
3. Characterization of Defect Structure in Epilayer Grown on On-Axis SiC by Synchrotron X-ray Topography;Journal of Electronic Materials;2022-01-16
4. Characterization of morphological defects related to micropipes in 4H-SiC thick homoepitaxial layers;Journal of Crystal Growth;2021-08
5. Photoelectrochemical Oxidation Assisted Catalyst-Referred Etching for SiC (0001) Surface;International Journal of Automation Technology;2021-01-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3