Author:
Triyoso D. H.,Gregory R.,Park M.,Wang K.,Lee S. I.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. D. H. Triyoso, R. I. Hegde, W. J. Taylor, Jr., R. Gregory, X.-D. Wang, J. K. Schaeffer, S. Filipiak, D. Gilmer, M. Raymond, K. Junker, et al. , inAVS Atomic Layer Deposition Conference Proceedings, American Vacuum Society, p. 4 (2007).
2. Hafnium zirconate gate dielectric for advanced gate stack applications
3. M. Ritala and M. Leskela , inHandbook of Thin Film Materials, H. S. Nalwa , Editor, p. 103, Academic Press, San Diego, CA (2001).
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14 articles.
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