Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors-Reference-Cited by-同舟云学术

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Atomic layer deposition of PbTiO3 and PbZrxTi1-xO3 films using metal alkyl and alkylamide precursors

Published:2018-05 Issue:3 Volume:36 Page:031509
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Sbrockey Nick M.,Tompa Gary S.,Lavelle Robert,Trumbull Kathleen A.,Fanton Mark A.,Snyder David W.,Polcawich Ronald G.,Potrepka Daniel M.

Funder

Army Research Office

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.5014030

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Integration of ferroelectric BIT and dielectric HfO2 on silicon substrate with high data retention and endurance for ferroelectric FET applications;Applied Physics A;2019-11

2. Atomic layer deposition of functional multicomponent oxides;APL Materials;2019-11-01

3. Texture and phase variation of ALD PbTiO3 films crystallized by rapid thermal anneal;Journal of Vacuum Science & Technology A;2019-03

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