HfxZr1 − xO2 thin films for semiconductor applications: An Hf- and Zr-ALD precursor comparison
Author:
Affiliation:
1. Namlab gGmbH, Noethnitzer Strasse 64a, 01187 Dresden, Germany
2. TU Dresden, Chair Nanoelectronic Materials, Noethnitzer Strasse 64, 01187 Dresden, Germany
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5134135
Cited by 27 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ultralow operating voltage for energy conversion performance in Hf1–Zr O2 thin films;Journal of Materiomics;2024-11
2. Investigation of Hf₀.₅Zr₀.₅O₂ Ferroelectric Films at Low Thermal Budget (300 °C);IEEE Transactions on Electron Devices;2024-08
3. Improvement of the Ferroelectric Response of La-Doped Hafnium Zirconium Oxide Employing Tungsten Oxide Interfacial Layer with Back-End-of-Line Compatibility;ACS Applied Materials & Interfaces;2024-07-26
4. Performance Optimization for Ferroelectric HfZrOx on a Ge Substrate by Modifying the Deposition Temperature;IEEE Transactions on Nanotechnology;2024
5. Smart Design of Fermi Level Pinning in HfO2‐Based Ferroelectric Memories;Advanced Functional Materials;2023-10-08
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3