Effect of Sodium Periodate in Alumina-Based Slurry on Ru CMP for Metal–Insulator–Metal Capacitor-Reference-Cited by-同舟云学术

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Effect of Sodium Periodate in Alumina-Based Slurry on Ru CMP for Metal–Insulator–Metal Capacitor

Published:2008 Issue:6 Volume:11 Page:H150
ISSN:1099-0062
Container-title:Electrochemical and Solid-State Letters
language:en
Short-container-title:Electrochem. Solid-State Lett.

Author:

Kim In-Kwon,Kang Young-Jae,Kwon Tae-Young,Cho Byoung-Gwun,Park Jin-Goo,Park Jum-Yong,Park Hyung-Soon

Publisher

The Electrochemical Society

Subject

Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering

Reference17 articles.

1. MIM capacitors using amorphous high-k PrTixOy dielectrics

2. Combining Ta[sub 2]O[sub 5] and Nb[sub 2]O[sub 5] in Bilayered Structures and Solid Solutions for Use in MIM Capacitors

3. Deposition and Characterization of Ru Thin Films Prepared by Metallorganic Chemical Vapor Deposition

4. Electrodeposition of Copper Thin Film on Ruthenium

5. Damascene Cu electrodeposition on metal organic chemical vapor deposition-grown Ru thin film barrier

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