Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing-Reference-Cited by-同舟云学术

Passivation Kinetics of 1,2,4-Triazole in Copper Chemical Mechanical Polishing

Published:2016 Issue:5 Volume:5 Page:P272-P279
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Jiang Liang,He Yongyong,Li Jing,Luo Jianbin

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference49 articles.

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