Lithographic performance of a dual-stage 0.93NA ArF step and scan system
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SPIE
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optical wafer metrology sensors for process-robust CD and overlay control in semiconductor device manufacturing;Surface Topography: Metrology and Properties;2016-02-17
2. Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers;Journal of Applied Physics;2011-10-15
3. Impact of polarized illumination on high NA imaging in ArF immersion lithography at 45 nm node;Optik;2009-03
4. Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner;SPIE Proceedings;2008-11-20
5. Formulas for lithographic parameters when printing isolated and dense lines;Journal of Micro/Nanolithography, MEMS, and MOEMS;2005-10-01
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