Photo-triggering and secondary electron produced ionization in electric discharge ArF* excimer lasers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3644953
Reference29 articles.
1. Lithographic performance of a dual-stage 0.93NA ArF step and scan system
2. Progressive ArF exposure tool for 65nm node lithography
3. Characterization of laser-ablation plasmas
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