Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner-Reference-Cited by-同舟云学术

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Extending KrF lithography beyond 80nm with the TWINSCAN XT:1000H 0.93NA scanner

Published:2008-11-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

de Boeij Wim,Dicker Gerald,de Wit Marten,Bornebroek Frank,Zellenrath Mark,Voorma Harm-Jan,Smeets Bart,Toussaint Rene,Paarhuis Bart,de Jong Marteijn,Hellweg Dirk,Kornitzer Klaus

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical Lithography;Nanofabrication;2024

2. Lithography Solutions in Novel High Frequency SiGe HBT Device;ECS Transactions;2019-12-15

3. DFM Study in Low k1 Lithography Process;ECS Transactions;2019-12-15

4. 65nm Node Possibility Study in 200mm FABS;2019 China Semiconductor Technology International Conference (CSTIC);2019-03

5. Immersion and dry scanner extensions for sub-10nm production nodes;SPIE Proceedings;2015-03-18

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