Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment-Reference-Cited by-同舟云学术

Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment

Published:2018-03-13 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control for Microlithography XXXII
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Author:

Soco Aileen,Hinnen Paul,McNamara Elliott,Miceli Giacomo,Böcker Paul,Kim Young-Sik,Park Dong-Kiu,Kim Hyun-Sok,Seo Moo-Young,Ju Jae-Wuk,Shahrjerdy Mir,van Leest Arno J.,Oh Nang-Lyeom,Jung Sang-Hoon,Chai Yvon,Lee Jun-Hyung,Massier Jennifer

Publisher

SPIE

Reference8 articles.

1. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

2. Holistic lithography and metrology’s importance in driving patterning fidelity;van den Brink,2016

3. Metrology challenges for advanced lithography techniques

4. Application of advanced diffraction based optical metrology overlay capabilities for high-volume manufacturing

5. Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing.

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1. Mitigating the Impact of Asymmetric Deformation on Advanced Metrology for Photolithography;Applied Sciences;2024-05-23

2. 极紫外光刻中的边缘放置误差控制;Chinese Journal of Lasers;2024

3. On-scanner high-spatial-frequency overlay control using a distortion manipulator;Optical and EUV Nanolithography XXXV;2022-05-26

4. Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20