Metrology challenges for advanced lithography techniques-Reference-Cited by-同舟云学术

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Metrology challenges for advanced lithography techniques

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Englard Ilan,Vanoppen Peter,Finders Jo,Minnaert-Janssen Ingrid,Duray Frank,Meessen Jeroen,Janssen Gert-Jan,Adan Ofer,Gershtein Liraz,Peltinov Ram,Masia Claudio,Piech Richard

Publisher

SPIE

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterizing interlayer edge placement with SEM contours;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-04-15

2. Enabling optical metrology on small 5x5um2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-13

3. Unique method for controlling device level overlay with high-NA optical overlay technique using YieldStar in a DRAM HVM environment;Metrology, Inspection, and Process Control for Microlithography XXXII;2018-03-13

4. Critical dimension scanning electron microscope local overlay measurement and its application for double patterning of complex shapes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-04-01

5. Spatial signature in local overlay measurements: what CD-SEM can tell us and optical measurements can not;SPIE Proceedings;2010-03-11

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