Enabling optical metrology on small 5x5um2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes-Reference-Cited by-同舟云学术

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Enabling optical metrology on small 5x5um2 in-cell targets to support flexible sampling and higher order overlay and CD control for advanced logic devices nodes

Published:2018-03-13 Issue: Volume: Page:
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Container-title:Metrology, Inspection, and Process Control for Microlithography XXXII
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Author:

Salerno Antonio,Hsu Zack,de le Fuente Isabel,McNamara Elliott,Li Daoping,Chang Hammer,Tai Alan,Cramer Hugo

Publisher

SPIE

Reference6 articles.

1. On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections;Bhattacharyya,2013

2. Holistic lithography and metrology's importance in driving patterning fidelity

3. Metrology challenges for advanced lithography techniques;Englard,2007

4. Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing;Benschop,2013

5. Mixed-mode, high-order multi-patterning control strategy with small-spot, optical CD metrology on device structures;Cramer,2016

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enabling accurate and robust optical metrology of in device overlay;Metrology, Inspection, and Process Control for Microlithography XXXIV;2020-03-20

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