1. A Novel Methodology for Triple/Multiple-Patterning Layout Decomposition;Ghaida,2012
2. Highly manufacturable FinFETs with sub-10nm fin width and high aspect ratio fabricated with immersion lithography;Van Dal,2007
3. Holistic approach using accuracy of diffraction-based integrated metrology to improve on-product performance, reduce cycle time and cost at litho;Bhattacharyya,2015
4. Tighter process control of poly- and active-to-contact overlay registration via multilayer analysis;Lee,2000
5. New approaches in diffraction based optical metrology;Ebert,2016