Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography-Reference-Cited by-同舟云学术

Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography

Published:2012-05-29 Issue:2 Volume:11 Page:021111-1
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Fujimoto Junichi,Abe Tamotsu,Tanaka Satoshi,Ohta Takeshi,Hori Tsukasa,Yanagida Tatsuya,Nakarai Hiroaki,Mizoguchi Hakaru

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. EUV lithography with the Alpha Demo Tools: status and challenges

2. Nikon EUVL development progress update

3. EUV into production with ASML's NXE platform

4. EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100

5. Laser produced EUV light source development for HVM

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