Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μ m range for their characterization as future extreme ultraviolet light sources

Author:

Hemminga D. J.12ORCID,Versolato O. O.12ORCID,Sheil J.12ORCID

Affiliation:

1. Advanced Research Center for Nanolithography 1 , Science Park 106, 1098 XG Amsterdam, The Netherlands

2. Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam 2 , De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands

Abstract

We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the λ laser = 1.064 − 10.6   μ m range and laser intensities of I laser = 0.5 − 5 × 10 11 W cm−2 for λ laser = 1.064   μ m. Detailed numerical simulations of laser-irradiated spherical tin microdroplet targets reveal a strong laser-wavelength dependence on laser absorptivity and the conversion efficiency of generating in-band EUV radiation. For λ laser = 1.064   μ m irradiation, the increase in in-band radiation with increasing laser intensity is offset by only a minor reduction in conversion efficiency. Radiative losses are found to dominate the power balance for all laser wavelengths and intensities, and a clear shift from kinetic to in-band radiative losses with increasing laser wavelength is identified. Yet, with increasing laser intensity, such a shift is absent. We find that the existence of a maximum conversion efficiency, near λ laser = 4   μ m, originates from the interplay between the optical depths of the laser light and the in-band EUV photons for this specific droplet-target geometry.

Funder

HORIZON EUROPE European Research Council

Publisher

AIP Publishing

Subject

Condensed Matter Physics

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