EUV into production with ASML's NXE platform-Reference-Cited by-同舟云学术

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EUV into production with ASML's NXE platform

Published:2010-03-11 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Wagner Christian,Harned Noreen,Kuerz Peter,Lowisch Martin,Meiling Hans,Ockwell David,Peeters Rudy,van Ingen-Schenau Koen,van Setten Eelco,Stoeldraijer Judon,Thuering Bernd

Publisher

SPIE

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node;IEEE Transactions on Electron Devices;2023-11

2. High Harmonic Generation near the Low-Frequency Edge of a Plateau under Nonlinear Propagation of 1.24-μm Near-Infrared Femtosecond Laser Radiation in a Dense Argon Jet;JETP Letters;2023-08

3. Novel assist layers to enhance EUV lithography performance of photoresists on different substrates;Advances in Patterning Materials and Processes XL;2023-05-01

4. Update of >300W high power LPP-EUV source challenge III for semiconductor HVM;Extreme Ultraviolet (EUV) Lithography XII;2021-02-23

5. Self-aligned double patterning for active trim contacts with anisotropic pattern pitches in sub-20 nm dynamic random access memories;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-12-18

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