Reduction of residual stress in optical silicon nitcide thin films prepared by radio-frequency ion beam sputtering deposition
Author:
Publisher
SPIE-Intl Soc Optical Eng
Subject
General Engineering,Atomic and Molecular Physics, and Optics
Reference27 articles.
1. Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering
2. Growth and characterization of silicon nitride films for optoelectronics applications
3. Effect of deposition temperature on the chemical properties of thermally deposited silicon nitride films
4. A new fabrication method for low stress PECVD - SiNxlayers
5. Interference coatings based on synthesized silicon nitride
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-dielectric-constant silicon nitride thin films fabricated by radio frequency sputtering in Ar and Ar/N2 gas mixture;Thin Solid Films;2020-09
2. Reduction of residual stress in polymorphous silicon germanium films and their evaluation in microbolometers;The European Physical Journal Applied Physics;2020-03
3. Improving optical properties of silicon nitride films to be applied in the middle infrared optics by a combined high-power impulse/unbalanced magnetron sputtering deposition technique;Applied Optics;2014-01-24
4. Thermal expansion coefficient and thermomechanical properties of SiNx thin films prepared by plasma-enhanced chemical vapor deposition;Applied Optics;2012-10-15
5. Thermal expansion coefficients of obliquely deposited MgF_2 thin films and their intrinsic stress;Applied Optics;2010-12-02
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3