Improving optical properties of silicon nitride films to be applied in the middle infrared optics by a combined high-power impulse/unbalanced magnetron sputtering deposition technique-Reference-Cited by-同舟云学术

Improving optical properties of silicon nitride films to be applied in the middle infrared optics by a combined high-power impulse/unbalanced magnetron sputtering deposition technique

Published:2014-01-24 Issue:4 Volume:53 Page:A377
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Liao Bo-Huei,Hsiao Chien-Nan

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference21 articles.

1. Infrared dielectric properties of low-stress silicon nitride

2. Optical and structural properties of silicon nitride thin films prepared by ion-assisted deposition

3. Surface characterization and properties of silicon nitride films prepared by ion-assisted deposition

4. Sputter deposition of silicon oxynitride gradient and multilayer coatings

5. Fabrication of silicon nitride waveguides for visible-light using PECVD: a study of the effect of plasma frequency on optical properties

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