Widely tunable refractive index silicon nitride films deposited by ion-assisted pulsed DC reactive magnetron sputtering-Reference-Cited by-同舟云学术

Widely tunable refractive index silicon nitride films deposited by ion-assisted pulsed DC reactive magnetron sputtering

Published:2023-02 Issue: Volume:136 Page:113354
ISSN:0925-3467
Container-title:Optical Materials
language:en
Short-container-title:Optical Materials

Author:

You Daoming^ORCID,Jiang Yu^ORCID,Zhao Yali,Guo Wentao,Tan Manqing

Funder

Youth Innovation Promotion Association of the Chinese Academy of Sciences

Beijing Nova Program

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials,Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Spectroscopy

Reference37 articles.

1. Silicon nitride in silicon photonics;Blumenthal;Proc. IEEE,2018

2. Ultralow-loss silicon nitride waveguides for parametric amplification;Ye,2022

3. Review—silicon nitride and silicon nitride-rich thin film technologies: state-of-the-art processing technologies, properties, and applications;Kaloyeros;ECS Journal of Solid State Science and Technology,2020

4. High-performance lasers for fully integrated silicon nitride photonics;Xiang;Nat. Commun.,2021

5. Recent advances in silicon nitride-based photonic devices and applications;Zhi-bin;Chinese Optics,2021

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