Silicon nitride thin-films deposited by radiofrequency reactive sputtering: Refractive index optimization with substrate cooling in a nitrogen-rich atmosphere
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Published:2024-03
Issue:
Volume:149
Page:115130
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ISSN:0925-3467
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Container-title:Optical Materials
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language:en
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Short-container-title:Optical Materials
Author:
Freitas João R.ORCID,
Pimenta Sara,
Rodrigues Vítor H.,
Silva Manuel F.,
Correia José H.