Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.367440
Reference43 articles.
1. SiOxNy films deposited by remote plasma enhanced chemical vapor deposition using SiCl4
2. Low hydrogen content stoichiometric silicon nitride films deposited by plasma‐enhanced chemical vapor deposition
3. Effect of reactive‐ion bombardment on the properties of silicon nitride and oxynitride films deposited by ion‐beam sputtering
4. Low temperature fabrication of amorphous silicon thin film transistors by dc reactive magnetron sputtering
5. Effect of Reactant Nitrogen Pressure on the Microstructure and Properties of Reactively Sputtered Silicon Nitride Films
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