Thermal expansion coefficient and thermomechanical properties of SiNx thin films prepared by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Thermal expansion coefficient and thermomechanical properties of SiNx thin films prepared by plasma-enhanced chemical vapor deposition

Published:2012-10-15 Issue:30 Volume:51 Page:7229
ISSN:1559-128X
Container-title:Applied Optics
language:en
Short-container-title:Appl. Opt.

Author:

Tien Chuen-Lin,Lin Tsai-Wei

Funder

National Science Council of Taiwan

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics,Engineering (miscellaneous),Electrical and Electronic Engineering

Reference23 articles.

1. Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering

2. Growth and characterization of silicon nitride films for optoelectronics applications

3. Effect of deposition temperature on the chemical properties of thermally deposited silicon nitride films

4. A new fabrication method for low stress PECVD - SiNxlayers

5. Reduction of residual stress in optical silicon nitcide thin films prepared by radio-frequency ion beam sputtering deposition

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5. Photonic Band Gap and Fractal Resonances in Aperiodic Cantor-like Self-Similar a:SiN_x Photonic Structures;ACS Applied Optical Materials;2024-04-05

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