Substrate-dependent structural evolution during the oxidation of SiNx thin films
Author:
Funder
Korea Research Institute of Chemical Technology
Ministry of Trade, Industry and Energy
Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s10853-024-09751-w.pdf
Reference44 articles.
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2. Chen TN et al (2006) High-performance transparent barrier films of SiOx∕SiNx stacks on flexible polymer substrates. J Electrochem Soc 153:F244–F248
3. Habraken FHPM, Kuiper AET (1994) Silicon nitride and oxynitride films. Mater Sci Eng R Rep 12:123–175
4. Gatz S, Plagwitz H, Altermatt PP, Terheiden B, Brendel R (2008) Thermal stability of amorphous silicon/silicon nitride stacks for passivating crystalline silicon solar cells. Appl Phys Lett 93:173502-1–173502-3
5. Du Q et al (2017) Gamma radiation effects in amorphous silicon and silicon nitride photonic devices. Opt Lett 42:587–590
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