Extreme ultraviolet multilayer defect analysis and geometry reconstruction-Reference-Cited by-同舟云学术

Extreme ultraviolet multilayer defect analysis and geometry reconstruction

Published:2016-01-19 Issue:1 Volume:15 Page:014002
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Xu Dongbo¹,Evanschitzky Peter²,Erdmann Andreas¹

Affiliation:

1. Friedrich-Alexander-Universität Erlangen-Nürnberg, Erlangen Graduate School in Advanced Optical Technologies, Paul Gordan Strasse 6, Erlangen 91052, GermanybFriedrich-Alexander-Universität Erlangen-Nürnberg, Chair of Electron Devices, Cauerstrasse 6, Erla

2. Fraunhofer Institute for Integrated Systems and Device Technology, Schottkystrasse 10, Erlangen 91058, Germany

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference41 articles.

1. AIMS EUV: the actinic aerial image review platform for EUV masks

2. Actinic inspection of multilayer defects on EUV masks

3. Improving the performance of the actinic inspection tool with an optimized alignment procedure

4. Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

5. Simulation of Multilayer Defects in Extreme Ultraviolet Masks

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Inverse analysis of multilayer defects in EUV mask from the perspective of imaging performance;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Multilayer defect compensation based on three dimensional absorber correction in EUV lithography;Fourteenth International Conference on Information Optics and Photonics (CIOP 2023);2023-11-24

3. Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images;Fourteenth International Conference on Information Optics and Photonics (CIOP 2023);2023-11-24

4. Phase defect characterization using generative adversarial networks for extreme ultraviolet lithography;Applied Optics;2023-02-06

5. 极紫外光刻掩模相位型缺陷检测方法;Acta Optica Sinica;2023