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Inverse analysis of multilayer defects in EUV mask from the perspective of imaging performance

  • Published:2024-04-10 Issue: Volume:11517 Page:65
  • ISSN:
  • Container-title:Optical and EUV Nanolithography XXXVII
  • language:
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Author:

Li Chen,Dong Lisong,Wei Yayi

Publisher

SPIE

Reference17 articles.

1. High-NA EUV lithography exposure tool: advantages and program progress;Schoot,2021

2. EUV and Optical Lithographic Pattern Shift at the 5nm Node;Hosler,2016

3. Advanced Euv Mask and Imaging Modeling;Erdmann;J. Micro/Nanolith. MEMS MOEMS,2017

4. EUV Mask Defects and Their Removal;Behringer,2012

5. Investigation of EUV Mask Defectivity Via Full-Field Printing and Inspection on Wafer;Hosono,2009
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