1. EUVL is being inserted in manufacturing in 2019: What are the mask related challenges remaining?;Ronse,2019
2. 0.33 NA EUV systems for high volume manufacturing;Verhoeven,2020
3. Actinic metrology platform for defect review and mask qualification: flexibility and performance;Capelli,2019
4. Overcoming EUV mask blank defects: what we can, and what we should;Jonckheere,2017
5. Through-focus EUV multilayer defect repair with nanomachining;McIntyre,2013