Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete

Author:

Terasawa Tsuneo,Yamane Takeshi,Tanaka Toshihiko,Iwasaki Teruo,Suga Osamu,Tomie Toshihisa

Publisher

SPIE

Cited by 39 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Actinic patterned mask inspection for high-NA EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Actinic patterned mask inspection for EUV lithography;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

3. Mask inspection technologies for expanding EUV lithography;Photomask Technology 2022;2022-12-01

4. Enabling EUVL high-volume manufacturing with actinic patterned mask inspection;Extreme Ultraviolet (EUV) Lithography XI;2020-04-09

5. EUV mask infrastructure and actinic pattern mask inspection;Extreme Ultraviolet (EUV) Lithography XI;2020-03-23

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