Enabling EUVL high-volume manufacturing with actinic patterned mask inspection-Reference-Cited by-同舟云学术

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Enabling EUVL high-volume manufacturing with actinic patterned mask inspection

Published:2020-04-09 Issue: Volume: Page:
ISSN:
Container-title:Extreme Ultraviolet (EUV) Lithography XI
language:
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Author:

Tchikoulaeva Anna,Miyai Hiroki,Kohyama Tsunehito,Takehisa Kiwamu,Kusunose Haruhiko

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Actinic patterned mask inspection for high-NA EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Actinic pattern mask inspection for high-NA EUV lithography;Photomask Technology 2023;2023-11-21

3. Actinic patterned mask inspection for EUV lithography;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

4. Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography;Microelectronics Journal;2023-03

5. High throughput defect inspection and ptychographic review for EUV mask;AOPC 2022: Optical Sensing, Imaging, and Display Technology;2023-01-23

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