Author:
Chen Chuangchuang,Zhou Yu,Li Wenjie,Liu Li,Gu Honggang,Liu Shiyuan
Reference17 articles.
1. Analysis of Printability of Scratch Defect on Reflective Mask in Extreme Ultraviolet Lithography
2. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography;Erdmann;Adv. Opt. Technol.,2017
3. Actinic patterned mask defect inspection for EUV lithography;Miyai,2019
4. Actinic characterization and modeling of the EUV mask stack;Philipsen,2013
5. Measurement of through-focus EUV pattern shifts using the SHARP actinic microscope;Chen,2017