Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images-Reference-Cited by-同舟云学术

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Analysis of extreme ultraviolet mask defect inspection based on complex amplitudes of the aerial images

Published:2023-11-24 Issue: Volume: Page:
ISSN:
Container-title:Fourteenth International Conference on Information Optics and Photonics (CIOP 2023)
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Author:

Zhang Longqaio,Li Sikun,Zheng Hang,Yuan Shuai,Wang Xiangzhao

Publisher

SPIE

Reference23 articles.

1. Defect repairs for the extreme ultraviolet mask;Kim,2021

2. EUVL mask blank repair;Barty,2002

3. EUV multilayer defect compensation (MDC) by absorber pattern modification, film deposition, and multilayer peeling techniques;Pang,2013

4. Actinic EUVL mask blank defect inspection by EUV photoelectron microscopy;Kleineberg,2006

5. Lithographic characterization of EUVL mask blank defects;Hashimoto,2004

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mask defect detection by combining wiener deconvolution and illumination optimization;Microelectronic Engineering;2024-10

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