Prediction of biases for optical proximity correction through partial coherent identification-Reference-Cited by-同舟云学术

Prediction of biases for optical proximity correction through partial coherent identification

Published:2016-03-17 Issue:1 Volume:15 Page:013509
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Jeong Moongyu¹,Hahn Jae W.²

Affiliation:

1. Yonsei University, School of Mechanical Engineering, Nano Photonics Laboratory, 50 Yonsei-ro, Seodaemun-gu, Seoul, 120-749, Republic of KoreabSamsung Electronics Co. Ltd., Semiconductor R&D Center, Process Development 1 Team, San #16 Banwol-dong, Hwasung-

2. Yonsei University, School of Mechanical Engineering, Nano Photonics Laboratory, 50 Yonsei-ro, Seodaemun-gu, Seoul, 120-749, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference29 articles.

1. Double patterning design split implementation and validation for the 32nm node

2. 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

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5. Modeling of electromagnetic effects from mask topography at full-chip scale

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