Predictable etch model using machine learning-Reference-Cited by-同舟云学术

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Predictable etch model using machine learning

Published:2019-03-20 Issue: Volume: Page:
ISSN:
Container-title:Optical Microlithography XXXII
language:
Short-container-title:

Author:

Kim YoungChang,Jung Sunwook,Kwak DooHwan,Liubich Vlad,Fenger Germain

Publisher

SPIE

Reference17 articles.

1. Chip-scale Simulation of Pattern Processing: Methods, Models, Accuracy, and Applications;Granik,2000

2. Full-chip Process Simulation for Silicon DRC;Sahouria,2000

3. Correction for etch proximity: new models and applications

4. Dry etch proximity modeling in mask fabrication

5. Analysis of pattern density on process proximity compensation

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High-Accuracy Prediction of ScAlN Thin Film Dry Etching Using Machine Learning Driven Regression Modeling;ACS Applied Electronic Materials;2024-04-17

2. Prediction of etch bias using random forest model;DTCO and Computational Patterning III;2024-04-10

3. A new era DFM solution for yield enhancement using machine learning (ML);DTCO and Computational Patterning III;2024-04-10

4. A neural network assisted etch model for mask process correction;Photomask Technology 2022;2022-12-01

5. OPC accuracy improvement through deep-learning based etch model;Advanced Etch Technology and Process Integration for Nanopatterning XI;2022-05-25

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